Sains Malaysiana 48(6)(2019): 1295–1300
http://dx.doi.org/10.17576/jsm-2019-4806-18
Kesan Sistematik Modifikasi
Dielektrik dengan Asid Fosfonik Alkil Ekalapisan terhadap Prestasi
Transistor Filem Nipis Organik Saluran-N
(The Effect of
Systematic Modification of Phosphonic Acid Alkyl Dielektric with monolayer on
the Performance of Organic Thin Film Transistors-N Channel)
MOHD ZULHAKIMI ABDUL RAZAK1, MOHD FARHANULHAKIM MOHD RAZIP WEE1, MUHAMAD RAMDZAN BUYONG1,
SAWAL HAMID MD ALI2, TEH CHIN HOONG3, JUMADI ABDUL SUKOR4 & AHMAD GHADAFI ISMAIL1*
1Institut Kejuruteraan
Mikro dan Nanoelektronik, Universiti Kebangsaan Malaysia, 43600 UKM Bangi,
Selangor Darul Ehsan, Malaysia
2Pusat Kejuruteraan
Sistem Bersepadu dan Teknologi Termaju, Fakulti Kejuruteraan dan Alam Bina, Universiti
Kebangsaan Malaysia, 43600 UKM Bangi, Selangor Darul Ehsan, Malaysia
3Pusat PERMATApintar
Negara, Universiti Kebangsaan Malaysia, 43600 UKM Bangi, Selangor Darul Ehsan, Malaysia
4Fakulti Teknologi Kejuruteraan,
Universiti Tun Hussein Onn Malaysia, 84600 Panchor, Johor Darul Takzim, Malaysia
Received:
15 January 2019/Accepted: 28 February 2019
ABSTRAK
Kajian ini membincangkan
tentang kesan panjang rantai karbon pada asid alkil fosfonik ekalapis
pengumpulan kendiri terhadap prestasi transistor organik filem nipis
saluran-n terbentuk berdasarkan N,N’-ditridekil-3,4,9,10-perilenadikarboximide
(PTCDI-C13).
Prestasi transistor organik filem nipis tersebut meningkat dengan
peningkatan panjang rantai ekalapis pengumpulan kendiri pada dielektrik
SiO2. Magnitud
mobiliti setinggi 0.3 cm2/Vs dan nisbah arus buka/tutup
lebih tinggi daripada 105 telah dicapai. Transistor tersebut
adalah calon terbaik untuk menyaingi transistor organik filem nipis
pentacene saluran-p untuk menghasilkan litar semikonduktor logam
pelengkap teroksida organik (O-CMOS).
Prestasi peranti ini tidak bergantung terhadap panjang rantaian
alkil apabila diuji di dalam udara ambien.
Kata kunci: Asid
fosfonik; ekalapis pengumpulan kendiri; PTCDI; salur-n; transistor
filem nipis organic
ABSTRACT
The performance of
N,N’-ditridecyl-3,4,9,10-perylenetetracarboxylicdiimide (PTCDI-C13)
based n-channel organic thin film transistors with different carbon chain
length of alkyl phosphonic acid self-assembled monolayers were investigated and
presented in this paper. The study observed an improving trend in the
performance of the organic thin film transistor with increasing self-assembled
monolayer chain length on SiO2 dielectric. The results show
mobility improvement reaching 0.3 cm2/Vs and larger than 105 on/off
current ratio. This study suggests these transistors should be a good match
with p-channel pentacene organic thin film transistors for an organic
complementary metal oxide semiconductor (O-CMOS)
circuits. The device has no dependency with the alkyl chain length when tested
in ambient air.
Keywords: N-channel; organic thin film transistor; phosphonic
acid; PTCDI; self-assembled monolayer
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*Corresponding
author; email: ghad@ukm.edu.my
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