Sains Malaysiana 50(2)(2021): 515-523

http://dx.doi.org/10.17576/jsm-2021-5002-22

Image Reversal Resist Photolithography of Silicon-Based Platinum and Silver Microelectrode Pattern

(Fotolitografi Tahan Pembalikan Imej Silikon Berasaskan Corak Mikroelektrod Platinum dan Perak)

NURULHAIDAH DAUD¹*, NOR FARHAH RAZAK¹, NORMAHIRAH NEK ABD RAHMAN¹, AZIZAH MOHD ZAHIDI¹, CHIN SIEW XIAN¹, TENGKU ELMI AZLINA TENGKU MUDA¹ & MOHD ISMAHADI SYONO²

¹Pusat GENIUS@Pintar Negara, Universiti Kebangsaan Malaysia, 43600 UKM Bangi, Selangor Darul Ehsan, Malaysia

²Nano Semiconductor Technology, Mimos Berhad, Technology Park Malaysia, 57000 Kuala Lumpur, Malaysia

Diserahkan: 27 Julai 2018/Diterima: 11 Julai 2020

ABSTRACT

Silicon-based platinum (Pt) and silver (Ag) microelectrodes are constructed using photolithography technique and used in detecting arsenic activity in different electrolytes. Pt and Ag have good properties either as a working, a counter, or a reference electrode due to their low electrical resistance, high melting point, and high chemical stability. This chemical sensor has the ability to detect the changes in the level or activity of arsenic in electrolytes. Patterning these metals by wet chemical or dry etching is not a feasible process as these metals cannot be etched properly. The lift-off process can be applied to ease the etching process, but it has a major problem whereby the metal particles or ears may remain at the edges at the end of the process. The process variables, particularly the resist slope, were investigated to reduce possible defects using an image reversal resist. The thickness and angle of the resist side wall were measured by SEM. The effects of many factors that may influence or resist steep angle formation were analyzed and optimized with the Design of Experiment (DOE) technique to achieve the target recipe of resist angle < 60°. The lower angle of the resist side wall resulted in a better percentage yield of good electrode pattern after the lift-off process. The ability of fabricated microelectrode and influence of supporting electrolytes in arsenic determination were discussed.

Keywords: Lift-off; metal ear; photolithography; resist slope

ABSTRAK

Silikon berasaskan corak mikroelektrod platinum dan perak telah dibangunkan menggunakan teknik fotolitografi tahan pembalikan imej dan diuji dalam ujian awal dengan kitaran voltammetri. Membuat corak logam ini dengan bahan kimia basah atau kering bukanlah proses yang wajar kerana logam ini tidak dapat terukir dengan betul. Proses pengangkatan dalam fotolitografi dapat diaplikasikan untuk memudahkan proses pemunaran, tetapi ia mempunyai masalah besar kerana zarah logam atau telinga logam mungkin berada di tepi corak elektrod di akhir proses. Pemboleh ubah proses, terutamanya kemerosotan rintang dikaji untuk mengurangkan kemungkinan kecacatan menggunakan penentangan pembalikan imej. Ketebalan dan sudut dinding sisi rintang diukur dengan mikroskop elektron imbasan (SEM). Kesan daripada banyak faktor yang dapat mempengaruhi pembentukan sudut curam rintang dianalisis dan dioptimumkan dengan teknik Reka Bentuk Uji Kaji (DOE) untuk mencapai resipi sasaran sudut menolak ≤ 60°. Sudut bawah dinding sisi rintang menghasilkan hasil peratusan yang lebih baik bagi corak elektrod yang baik setelah proses mengangkat. Keupayaan mikroelektrik fabrikan dan pengaruh elektrolit pendukung dalam penentuan arsenik telah dibincangkan.

Kata kunci: Fotolitografi; logam telinga; pengangkatan; sudut penentangan

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*Pengarang untuk surat-menyurat; email: nurulhaidah@ukm.edu.my